Patent
1997-06-13
1999-10-26
Teska, Kevin J.
39550004, G06F 1750
Patent
active
059742445
ABSTRACT:
A layout pattern generation method and device executing this method in which a symbolic layout of a semiconductor integrated circuit is generated, the sizes of transistors are changed by using the circuit connection information of the layout pattern, the correspondence information of the transistors whose sizes have been changed are generated by using the symbolic layout and the changed circuit connection information, the symbolic layout after the transistor sizes have been changed is generated by using the correspondence information, the generated symbolic layout is compacted, and then a new layout pattern is generated by using the compacted layout pattern.
REFERENCES:
patent: 4827428 (1989-05-01), Dunlop et al.
patent: 5493509 (1996-02-01), Matsumoto et al.
patent: 5610831 (1997-03-01), Matsumoto
patent: 5612893 (1997-03-01), Hao et al.
patent: 5633807 (1997-05-01), Fishburn et al.
patent: 5745374 (1998-04-01), Matsumoto
patent: 5764530 (1998-06-01), Yokomaku
patent: 5880967 (1999-03-01), Jyu et al.
Kishida et al., "Transistor size optimization in layout design rule", Proceedings of the IEEE Custom Integrated Circuits Conference, May 1, 1994, pp. 541-544, especially p. 542.
De Lange et al. ("A hierarchical graph oriented compaction system for symbolic layout", IEEE International Symposium on Circuits and Systems, vol. 1, pp. 57-60, May 8, 1989).
Marple et al. ("Tailor: a layout system based on trapezoidal corner stitching", IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, vol. 9, No. 1, Jan. 1990).
Rijnders et al. ("Design of a process-tolerant cell library for regular structures using symbolic layout and hierarchical compaction", IEEE Journal of Solid-State Circuits, vol. 23, No. 3, Jun. 1998, pp. 714-721).
Lin et al. ("A circuit disassembly technique for synthesizing Symbolic layouts from mask description", IEEE Transactions on Computer-Aided design of Integrated Circuits and Systems, vol. 9, No. 9, Sep. 1990, pp. 959-969) .
Hayashi Sachio
Nojima Reiko
Kabushiki Kaisha Toshiba
Kik Phallaka
Teska Kevin J.
LandOfFree
Layout pattern generation device for semiconductor integrated ci does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Layout pattern generation device for semiconductor integrated ci, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Layout pattern generation device for semiconductor integrated ci will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-773730