Layout pattern generating apparatus

Metal working – Barrier layer or semiconductor device making

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Details

437 48, 437 51, 437250, 364490, 364491, G06F 1500

Patent

active

053485580

ABSTRACT:
In a layout pattern generating apparatus, a truth value data grouping section 3 groups truth value data whose logic is "1" and which are adjacent to each other, and a coordinate value data calculating section 4 calculates coordinate data on a layout pattern at every grouped truth value data, thereby producing a layout pattern.

REFERENCES:
patent: 4528634 (1985-07-01), Nakhata et al.
patent: 4718017 (1988-01-01), Hutton et al.
patent: 4839821 (1989-06-01), Murakata

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