Layout of a vertical pattern used in dipole exposure apparatus

Details Layout of a vertical pattern used in dipole exposure apparatus Layout of a vertical pattern used in dipole exposure apparatus

2005-01-12

2008-09-23

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000

Reexamination Certificate

active

07427456

ABSTRACT:
A layout of vertical patterns in a mask used in a dipole exposure apparatus employing a dipole as an aperture, including the vertical patterns disposed vertically to the dipole, and tabs, having critical dimensions broader than those of the vertical patterns, crossing edges of the vertical patterns. The tabs having critical dimensions broader than those of the vertical patterns are additionally inserted into the edges of the vertical patterns disposed vertically to the dipole, thereby minimizing the difference in critical dimensions between central and edge portions of the vertical patterns so that the vertical patterns maintain uniform fine critical dimensions.

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