Layers used to prevent reticulation in photographic elements

Details Layers used to prevent reticulation in photographic elements Layers used to prevent reticulation in photographic elements

1975-05-16

1977-11-01

Brammer, Jack P.

Gas separation: apparatus

Electric field separation apparatus

Including gas flow distribution means

96 50PL, 96 87R, G03C 176, G03C 300

Patent

active

040563960

ABSTRACT:
A photographic light-sensitive material including a support, a non-light sensitive uppermost layer consisting of at least one organic synthetic high polymer compound as a film forming material and at least one light-sensitive layer between the support and the uppermost layer, said organic high polymer compound being selected from the group consisting of the following polymers (A) to (F):

REFERENCES:
patent: 2306071 (1942-12-01), McNally et al.
patent: 2391181 (1945-12-01), Minsk et al.
patent: 2751315 (1956-06-01), Staehle
patent: 2835582 (1958-05-01), Fowler et al.
patent: 3502501 (1970-03-01), Burczyk et al.
patent: 3512985 (1970-05-01), Harvey
patent: 3591379 (1971-07-01), Plakunov
patent: 3655407 (1972-04-01), McGraw
patent: 3877947 (1975-04-01), Tsuji et al.
patent: 3895949 (1975-07-01), Akamatsu et al.

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