Layered organoarsenous inorganic polymers

Details Layered organoarsenous inorganic polymers Layered organoarsenous inorganic polymers

1979-07-24

1983-02-15

Sneed, Helen M. S.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From aluminum- or heavy metal-containing reactant

260429R, 2604291, 2604292, 2604293, 2604295, 260435R, 260441, C07F 700, C08G 7900

Patent

active

043742424

ABSTRACT:
Layered organoarsenuous inorganic polymers are formed by reacting an organoarsenic acid with at least one tetravalent ion by reflux of the organoarsenic acid and the tetravalent ion in a liquid medium. There is formed a polymer in which the tetravalent metal has six coordinated bonds. The preferred tetravalent metal ions are zirconium, cerium, thorium, uranium, lead, hafnium, and titanium.

REFERENCES:
patent: 2312207 (1943-02-01), Clayton et al.
patent: 2476890 (1949-07-01), Morehouse
patent: 3106509 (1963-10-01), Nagasawa
Alberti et al., J. Inorg. Nucl. Chem. 40, 1113 (1978).
Maya, Inorg. Nucl. Chem. Letters, 15, 207 (1979).
Alberti, Accounts of Chem. Res. 11, 163 (1978).
Morgan, Organic Compounds of Arsenic and Antimony, Longmans, N.Y. (1918) pp. 83-89, 93-95, 105-107,120, 129-31, 142-150, 168 and 169.
Dub, Organometallic Compounds, Springer-Verlog, Berlin VIII, pp. 187-191 (1962).
Doak et al., Organometallic Compounds of Arsenic, Antimony and Bismuth, Wiley Intersc. N.Y., pp. 46-49 (1970).
Chem. Abstract 83, 70750g (1975).
Chem. Abstract 85, 13433y (1976).
Chem. Abstract 86, 155758c (1977).
Chem. Abstract 58, 1487b (1963).
Chem. Abstract 55, 11161C (1961).

Affiliated with

Also associated with

Rating

Layered organoarsenous inorganic polymers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Layered organoarsenous inorganic polymers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Layered organoarsenous inorganic polymers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1802588