Layered metal oxides containing interlayer oxides and their synt

Catalyst – solid sorbent – or support therefor: product or process – Catalyst or precursor therefor – Silicon containing or process of making

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B01J 2106, B01J 2010

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active

051283034

ABSTRACT:
A layered product comprises a layered metal oxide and pillars of an oxide of at least one element selected from Groups IB, IIB, IIIA, IIIB, IVA, IVB, VA, VB, VIA, VIIA and VIIIA of the Periodic Table of the Elements separating the layers of the metal oxide. Each layer of the metal oxide has the general formula

REFERENCES:
patent: 3914383 (1975-10-01), Kirsch et al.
patent: 4367163 (1983-01-01), Pinnavaia et al.
patent: 4510257 (1985-04-01), Lewis et al.
patent: 4600503 (1986-07-01), Angevine et al.
patent: 4613584 (1986-09-01), Schneider et al.
patent: 4629713 (1986-12-01), Suzuki et al.
patent: 4701428 (1987-10-01), Bellussi et al.
patent: 4728439 (1988-03-01), Kirker et al.
patent: 4831005 (1989-05-01), Aufdembrink
patent: 4831006 (1989-05-01), Aufdembrink
patent: 4859648 (1989-08-01), Landis et al.
patent: 4902392 (1990-02-01), Aufdembrink et al.
patent: 4933310 (1990-06-01), Aufdembrink et al.
Journal of Solid State Chemistry 66, 1987, pp. 7-10.
Journal of Solid State Chemistry 49, 1983, pp. 300-308.
"A New Class of Compound . . . ", A. F. Reid et al., 1967, pp. 1228-1233.
Angew. Chem. Nr. 12, 1960, pp. 413-415 (no translation).

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