Layered magnetic structures having improved surface...

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Magnetic field

Reexamination Certificate

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C257S295000, C257SE21665

Reexamination Certificate

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07402879

ABSTRACT:
The present invention provides a method of fabricating a portion of a memory cell, the method comprising providing a first conductor in a trench which is provided in an insulating layer and flattening an upper surface of the insulating layer and the first conductor, forming a material layer over the flattened upper surface of the insulating layer and the first conductor and flattening an upper portion of the material layer while leaving intact a lower portion of the material layer over the insulating layer and the first conductor.

REFERENCES:
patent: 5354712 (1994-10-01), Ho et al.
patent: 6110648 (2000-08-01), Jang
patent: 6174737 (2001-01-01), Durlam et al.
patent: 6181013 (2001-01-01), Liu et al.
patent: 6326218 (2001-12-01), Yunogami et al.
patent: 7129534 (2006-10-01), Tuttle
patent: 2002/0098705 (2002-07-01), Low

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