Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1993-11-05
1995-07-11
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204294, 204403, 204419, 427 99, 427249, 4272553, G01N 2726, C25B 1100, B05D 512, C23C 1600
Patent
active
054318009
ABSTRACT:
A method for the preparation of layered electrodes, including ultramicroelectrodes, through application of a thin film coating of an inorganic material to a conductor by use of chemical vapor deposition. The chemical vapor deposition techniques of the present invention provide a layered electrode that is efficiently and effectively manufactured in a standard reaction chamber at atmospheric pressure. The preferred conductors are carbon fibers and foams, and metal (platinum or gold) wires, meshes and foams. The precursors for the thin film deposition include those that yield thin-films of insulators, semiconductors, metals, and superconductors. During the chemical vapor deposition process, a thin film coating is formed on the conductor by the pyrolytic decomposition of the precursor vapor at the surface of the heated conductor. The hardness and rigidity of the thin film layer imparts durability and structure to the fragile and flexible conductors without significantly increasing the size of the device. The variable parameters in the deposition process are monitored and controlled so that the desired thickness of thin film coating will be obtained.
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Giolando Dean M.
Kirchhoff Jon R.
Bell Bruce F.
Niebling John
The University of Toledo
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