X-ray or gamma ray systems or devices – Beam control
Patent
1989-10-23
1991-01-29
Howell, Janice A.
X-ray or gamma ray systems or devices
Beam control
378 70, 378 84, 350607, 350629, 350630, G21K 100, G01N 2123, G02B 510, G02B 5126
Patent
active
049892266
ABSTRACT:
A method of treating a substrate having first and second sides with corresponding oppositely facing first and second surfaces, to produce curvature in the first surface. The method includes the steps of removing material, according to a predetermined pattern, from the second side of the substrate, and applying a stress-producing film of material to at least one surface of the substrate to thereby cause the substrate to bend to produce the desired curvature in the first surface.
REFERENCES:
patent: 4420222 (1983-12-01), Bret et al.
patent: 4451119 (1984-05-01), Meyers et al.
patent: 4461018 (1984-07-01), Ice et al.
patent: 4487196 (1984-12-01), Murphy
patent: 4525853 (1985-06-01), Keem et al.
patent: 4885055 (1989-12-01), Woodbury et al.
"Plated Copper Substrates . . . ", by Blevins et al., SPIE, vol. 171, Optical Components: Manufacture & Evaluation (1979), 125-130.
Knight Larry V.
Perkins Raymond R.
Thorne James M.
Woodbury Richard C.
Brigham Young University
Howell Janice A.
Wong Don
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