Plastic article or earthenware shaping or treating: apparatus – Distinct means to feed – support or manipulate preform stock...
Reexamination Certificate
2006-04-04
2006-04-04
Davis, Robert B. (Department: 1722)
Plastic article or earthenware shaping or treating: apparatus
Distinct means to feed, support or manipulate preform stock...
C425S174400, C425S135000
Reexamination Certificate
active
07021915
ABSTRACT:
An apparatus and method for controlling the surface level of a liquid residing within a relatively vertically stationary workpiece support platform disposed within a reservoir for use in stereolithographic processes wherein a layered object or structure is formed by selectively curing portions of the liquid to at least a semisolid state in multiple, at least partially superimposed layers. Providing precise control of liquid depth over the vertically stationary platform as well as focusing of a laser beam for curing the liquid at the varying surface levels thereof relative to the vertically stationary platform is effected using a laser range finder system controlled by a computer used to control the stereolithographic process in a closed loop fashion.
REFERENCES:
patent: 4575330 (1986-03-01), Hull
patent: 4996010 (1991-02-01), Modrek
patent: 4999143 (1991-03-01), Hull et al.
patent: 5015424 (1991-05-01), Smalley
patent: 5058988 (1991-10-01), Spence
patent: 5059021 (1991-10-01), Spence et al.
patent: 5059359 (1991-10-01), Hull et al.
patent: 5071337 (1991-12-01), Heller et al.
patent: 5096530 (1992-03-01), Cohen
patent: 5104592 (1992-04-01), Hull et al.
patent: 5123734 (1992-06-01), Spence et al.
patent: 5130064 (1992-07-01), Smalley et al.
patent: 5133987 (1992-07-01), Spence et al.
patent: 5141680 (1992-08-01), Almquist et al.
patent: 5143663 (1992-09-01), Leyden et al.
patent: 5164128 (1992-11-01), Modrek et al.
patent: 5173220 (1992-12-01), Reiff et al.
patent: 5174931 (1992-12-01), Almquist et al.
patent: 5182055 (1993-01-01), Allison et al.
patent: 5182056 (1993-01-01), Spence et al.
patent: 5182715 (1993-01-01), Vorgitch et al.
patent: 5184307 (1993-02-01), Hull et al.
patent: 5192469 (1993-03-01), Smalley et al.
patent: 5192559 (1993-03-01), Hull et al.
patent: 5209878 (1993-05-01), Smalley et al.
patent: 5234636 (1993-08-01), Hull et al.
patent: 5238639 (1993-08-01), Vinson et al.
patent: 5248456 (1993-09-01), Evans, Jr. et al.
patent: 5256340 (1993-10-01), Allison et al.
patent: 5264061 (1993-11-01), Juskey et al.
patent: 5267013 (1993-11-01), Spence
patent: 5278442 (1994-01-01), Prinz et al.
patent: 5287435 (1994-02-01), Cohen et al.
patent: 5321622 (1994-06-01), Snead et al.
patent: 5345391 (1994-09-01), Hull et al.
patent: 5358673 (1994-10-01), Heller et al.
patent: 5447822 (1995-09-01), Hull et al.
patent: 5482659 (1996-01-01), Sauerhoefer
patent: 5484314 (1996-01-01), Farnworth
patent: 5495328 (1996-02-01), Spence et al.
patent: 5501824 (1996-03-01), Almquist et al.
patent: 5508489 (1996-04-01), Benda et al.
patent: 5545367 (1996-08-01), Bae et al.
patent: 5693144 (1997-12-01), Jacobs et al.
patent: 5695707 (1997-12-01), Almquist et al.
patent: 5705117 (1998-01-01), O'Connor et al.
patent: 5776409 (1998-07-01), Almquist et al.
patent: 5779967 (1998-07-01), Hull
patent: 5840239 (1998-11-01), Partanen et al.
patent: 5855718 (1999-01-01), Nguyen et al.
patent: 5855836 (1999-01-01), Leyden et al.
patent: 5897825 (1999-04-01), Fruth et al.
patent: 5902537 (1999-05-01), Almquist et al.
patent: 5902538 (1999-05-01), Kruger et al.
patent: 5904889 (1999-05-01), Serbin et al.
patent: 5943235 (1999-08-01), Earl et al.
patent: 5945058 (1999-08-01), Manners et al.
patent: 6021358 (2000-02-01), Sachs
patent: 6158346 (2000-12-01), Zhang
patent: 6251488 (2001-06-01), Miller et al.
patent: 6259962 (2001-07-01), Gothait
patent: 6268584 (2001-07-01), Keicher et al.
patent: 6337122 (2002-01-01), Grigg et al.
patent: 6391251 (2002-05-01), Keicher et al.
patent: 6482576 (2002-11-01), Farnworth et al.
patent: 6483596 (2002-11-01), Philippi et al.
patent: 6537482 (2003-03-01), Farnworth
patent: 6544465 (2003-04-01), Farnworth et al.
patent: 6544902 (2003-04-01), Farnworth
patent: 6549821 (2003-04-01), Farnworth et al.
patent: 6658314 (2003-12-01), Gothait
patent: 6709795 (2004-03-01), Farnworth et al.
patent: 6740476 (2004-05-01), Farnworth et al.
patent: 2002/0090410 (2002-07-01), Tochimolo et al.
patent: 2002/0171177 (2002-11-01), Kritchman et al.
patent: 2003/0003179 (2003-01-01), Farnworth et al.
patent: 2003/0003180 (2003-01-01), Farnworth et al.
patent: 2003/0043360 (2003-03-01), Farnworth
patent: 2003/0068584 (2003-04-01), Farnworth et al.
patent: 2003/0090006 (2003-05-01), Farnworth
patent: 2003/0093173 (2003-05-01), Farnworth et al.
patent: 2003/0151167 (2003-08-01), Kritchman et al.
patent: 2003/0155693 (2003-08-01), Farnworth et al.
patent: 2003/0173713 (2003-09-01), Huang
patent: 2003/0207213 (2003-11-01), Farnworth
patent: 2003/0209837 (2003-11-01), Farnworth
patent: 2004/0142058 (2004-07-01), Farnworth
patent: 2004/0251242 (2004-12-01), Suh
patent: 19952998 (2001-09-01), None
patent: 56151516 (1981-11-01), None
patent: 08150662 (1998-06-01), None
patent: 2000263603 (2000-09-01), None
patent: WO 97/17664 (1997-05-01), None
U.S. Appl. No. 10/663,402, filed Sep. 16, 2003, entitled “Processes for Facilitating Removal of Stereolithographically Fabricated Objects From Platens of Stereolithographic Fabrication Equipment, Object Release Elements fro Effecting Such Processes, Systems and Fabrication Processes Employing the Object Release Elements, and Objects which have been Fabricated Using the Object Release Elements”, inventor Farnworth et al.
Miller et al, “Maskless Mesoscale Material Deposition”, Deposition Technology, Sep. 2001, pp. 20-22.
Miller, “New Laser-Directed Deposition Technology”, Microelectronic Fabrication, Aug. 2001, p. 16.
Webpage, Objet Prototyping the Future, How it Works, 2 pages, 2003.
Webpage, Objet Prototyping the Future, Object Full Core 700 Series, 1 pg, no date.
European Search Report dated Aug. 17, 2005 (5 pages).
Davis Robert B.
TraskBritt
LandOfFree
Layer thickness control for stereolithography utilizing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Layer thickness control for stereolithography utilizing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Layer thickness control for stereolithography utilizing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3580439