Layer member forming method

Details Layer member forming method Layer member forming method

1994-11-30

1997-07-22

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723E, 156345, 134 12, C23C 1600

Patent

active

056500130

ABSTRACT:
A chemical vapor reaction processing apparatus including a reaction chamber; a power source; a source of a reactive film forming gas; a device for inputting the reactive film forming gas into the chamber; a pair of electrodes connected to the power source, at least a portion of the pair of electrodes being provided in the reaction chamber; a power source for supplying a first electric power into the reaction chamber through the pair of electrodes to generate a plasma of the reactive film forming gas in the chamber for providing a plasma CVD deposition of the reactive film forming gas on a surface; a source of a reactive cleaning gas; a device for inputting the reactive cleaning gas into the chamber where the power source supplies a second electric power into the reaction chamber through the pair of electrodes to generate a plasma of the reactive cleaning gas in the chamber so that an inner wall of the chamber is cleaned by the plasma. The reactive cleaning gas may be a (a) fluoride cleaning gas or (b) a fluoride cleaning gas and a hydrogen cleaning gas.

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