Layer formation method, and substrate with a layer formed by...

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of coating supply or source outside of primary...

Reexamination Certificate

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C427S569000, C427S576000, C427S578000, C427S255230

Reexamination Certificate

active

10841115

ABSTRACT:
A layer formation method is disclosed which comprises supplying gas to a discharge space, exciting the supplied gas at atmospheric pressure or at approximately atmospheric pressure by applying a high frequency electric field across the discharge space, and exposing a substrate to the excited gas, wherein the high frequency electric field is an electric field in which a first high frequency electric field and a second high frequency electric field are superposed, frequency ω2of the second high frequency electric field is higher than frequency ω1of the first high frequency electric field, strength V1of the first high frequency electric field, strength V2of the second high frequency electric field and strength IV of discharge starting electric field satisfy relationship V1≧IV>V2or V1>IV≧V2, and power density of the second high frequency electric field is not less than 1 W/cm2.

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