X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2011-07-12
2011-07-12
Kao, Chih-Cheng G (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
Reexamination Certificate
active
07978821
ABSTRACT:
A device for measuring crystal orientation with an x-ray source using the Laue method and includes an apparatus for mapping a polycrystalline surface having a grain orientation. The apparatus including an x-ray source creating an x-ray beam, the beam having polychromatic photons, the beam collimated to a point on the polycrystalline surface. A two-dimensional x-ray detector with an aperture, the x-ray beam passing through the aperture, the detector detecting and collecting polychromatic photons diffracted from the polycrystalline surface and onto the detector. A means for moving the polycrystalline surface with respect to the x-ray source to collect a plurality of diffracted x-rays which define a Laue pattern. A data processing means to collect Laue patterns of the polycrystalline surface based upon the plurality of diffracted x-rays, the Laue patterns identifying a plurality of crystallographic orientations and a plurality of grain surface areas on the polycrystalline surface.
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Glavicic Michael G.
Kobryn Pamela A.
AFMCLO/JAZ
Kao Chih-Cheng G
Moore Jeffrey R.
The United States of America as represented by the Secretary of
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