Lateral shift measurement using an optical technique

Details Lateral shift measurement using an optical technique Lateral shift measurement using an optical technique

2006-10-17

2006-10-17

Allen, Stephone B. (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

C250S559300, C250S225000, C356S400000

Reexamination Certificate

active

07122817

ABSTRACT:
Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements comprise at least two measurements with different polarization states of incident light, each measurement including illuminating eh measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between eth diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

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