Lateral shift measurement using an optical technique

Details Lateral shift measurement using an optical technique Lateral shift measurement using an optical technique

2005-12-13

2005-12-13

Allen, Stephone B. (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

C356S400000, C356S401000

Reexamination Certificate

active

06974962

ABSTRACT:
The method for controlling layers alignment in a multi-layer sample (10), such a semiconductors wafer based on detecting a diffraction efficiency of radiation diffracted from the patterned structures (12, 14) located one above the other in two different layers of the sample.

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