Lateral semiconductor device and vertical semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – Combined with field effect transistor

Reexamination Certificate

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Details

C257S332000

Reexamination Certificate

active

06917060

ABSTRACT:
A vertical semiconductor device including a first conductivity type base layer having resistance higher then of a first conductivity type buffer layer, the first conductivity type buffer layer formed in one surface portion of the first conductivity type base layer, a second conductivity type drain layer selectively formed in a surface portion of the first conductivity type buffer layer, a second conductivity type base layer selectively formed in the other surface portion of the first conductivity type base layer, a first conductivity type source layer selectively formed in a surface portion of the second conductivity type base layer, a gate insulating film formed on the second conductivity type base layer between the first conductivity type source layer and the first conductivity type base layer, a gate electrode formed on the second conductivity type base layer via the gate insulating film, a drain electrode electrically connected to the second conductivity type drain layer, and a source electrode electrically connected to the first conductivity type source layer and the second conductivity type base layer, wherein the drain electrode is not electrically connected to the first conductivity buffer layer.

REFERENCES:
patent: 5068700 (1991-11-01), Yamaguchi et al.
patent: 5105243 (1992-04-01), Nakagawa et al.
patent: 5569941 (1996-10-01), Takahashi
patent: 6064086 (2000-05-01), Nakagawa et al.
patent: 6091086 (2000-07-01), Zommer
patent: 6150702 (2000-11-01), Funaki et al.
patent: 6262470 (2001-07-01), Lee et al.
patent: 6380586 (2002-04-01), Yoshikawa
patent: 8-227999 (1996-09-01), None

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