Lateral power MOSFET structure using silicon carbide

Active solid-state devices (e.g. – transistors – solid-state diode – Specified wide band gap semiconductor material other than... – Diamond or silicon carbide

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257369, 257395, 257401, 257403, H01L 2702

Patent

active

054480817

ABSTRACT:
A MOSFET device (100) having a silicon carbide substrate (102). A channel region (106) of a first conductivity type and an epitaxial layer (104) of a second conductivity type are located above the silicon carbide substrate (102). First and second source/drain regions (118), also of the first conductivity type are located directly within the channel region (106). No well region is placed between the first and second source/drain regions (118) and the channel region (106). A gate (120) is separated from the channel region (106) by an insulator layer (110). Insulator layer (110) has a thin portion (114) and a thick portion (116).

REFERENCES:
patent: 4994413 (1991-02-01), Eshita
patent: 5170231 (1992-12-01), Fujii et al.
patent: 5233215 (1993-08-01), Baliga
J. W. Palmour, et al. "Characterization of Device Parameters In High-Temperature Metal-Oxide-Semiconductor field-effect transistors in .beta.-SiC Thin Films", 26 Apr. 1988, extracted from: J. Appl. Phys. 64(4), 15 Aug. 1988, pp. 2168-2177.
Robert F. Davis, et al. "Thin Film Deposition and Microelectronic and Optoelectronic Device Fabrication and Characterization in Monocrystalline Alpha and Beta Silicon Carbide", extracted from : IEEE vol. 79, No. 5, May 1991, pp. 677-701.
K. Furukawa, et al. "Insulated-Gate and Junction-Gate FET's of CVD-Grown .beta.-SiC", extracted from: IEEE vol. EDL-8, No. 2, Feb. 1987, pp. 48-49.
K. Shibahara, et al. "Inversion-Type N-Channel MOSFET Using Antiphase-Domain Free Cubic-SiC Grown on Si(100)" extracted from: (1986 International) Conference on Solid State Device and Materials, Tokyo, 1986, pp. 717-720.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Lateral power MOSFET structure using silicon carbide does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lateral power MOSFET structure using silicon carbide, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lateral power MOSFET structure using silicon carbide will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-473872

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.