Patent
1985-11-29
1990-10-16
Hille, Rolf
357 38, 357 43, 357 22, 357 53, H01L 2974, H01L 2702, H01L 2980, H01L 2940
Patent
active
049639510
ABSTRACT:
The present invention relates generally to insulated gate transistors and more particularly, to laterally implemented insulated gate transistors having improved current capacity and improved immunity to latch-up. Specifically, it has been found that a lateral insulated gate transistor fabricated on a heavily doped substrate such as a p+ substrate exhibits improved current density. Further, the inclusion of an additional heavily doped region such as a P+ region proximate the base region contributes to improved latch-up immunity within the device.
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Adler Michael S.
Pattanayak Deva N.
Davis Jr. James C.
Fahmy Wael
General Electric Company
Hille Rolf
Ochis Robert
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