Lateral dual gate thyristor and method of fabricating same

Electrical transmission or interconnection systems – Nonlinear reactor systems – Parametrons

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 22, 357 43, 357 59, 307633, H01L 2974

Patent

active

047869585

ABSTRACT:
A semiconductor power device with bipolar regenerative switching characteristics provides insulated gate structures for controlling device turn-on and turn-off. Rapid turn-off is achieved in part by a lateral field effect pinch resistance and a vertical field effect pinch resistance produced by an electrically floating structure. The device is electrically isolated by layer of dielectric which allows it to be easily integrated with other circuit elements. The device can be controlled by low current and low positive voltages which provide for simpler interfacing and better electrical compatibility with other circuits in an automotive system. A method of manufacturing this device is also provided.

REFERENCES:
patent: 3891866 (1975-06-01), Okuhara et al.
patent: 4199774 (1980-04-01), Plummer
patent: 4604638 (1986-08-01), Matsuda
patent: 4605872 (1986-08-01), Rung
patent: 4654691 (1987-03-01), Shirasawa et al.
J. Plummer et al., "Insulated Gate Thyristors . . . ", I, & II, pp. 380-393, IEEE Trans. On Elec. Dev., vol. Ed-27 #2, Feb. 1980.
J. Tihanyi, "Funct. Integ. of Power MOS & Bipolar Devs.", 1980 IEDM Conf. Proc., CH1616-2, pp. 75-78.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Lateral dual gate thyristor and method of fabricating same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lateral dual gate thyristor and method of fabricating same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lateral dual gate thyristor and method of fabricating same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-438438

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.