Lateral bipolar transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Bipolar transistor structure

Reexamination Certificate

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Details

C257S575000, C257SE29173

Reexamination Certificate

active

07667294

ABSTRACT:
A P+ base drawing diffusion region is formed on a substrate having an SOI structure. N+ emitter diffusion regions are formed on both sides of the P+ base drawing diffusion region through isolation insulating films interposed therebetween. A P type SOI layer, which serves as a base diffusion region, is formed so as to surround the N+ emitter diffusion regions, and conductive layers are formed thereon. Further, an N+ collector diffusion region is formed so as to surround the conductive layers.

REFERENCES:
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patent: 5455188 (1995-10-01), Yang
patent: 6034413 (2000-03-01), Hastings et al.
patent: 6867477 (2005-03-01), Zheng et al.
patent: 6982473 (2006-01-01), Iwabuchi et al.
patent: 63-5552 (1988-01-01), None
patent: 4-207038 (1992-07-01), None
patent: 6-151859 (1994-05-01), None
patent: 7-153774 (1995-06-01), None
patent: 2002-368002 (2002-12-01), None

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