Laser writing method and apparatus

Coherent light generators – Particular beam control device – Scanning

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C372S022000, C372S039000, C372S013000, C372S018000

Reexamination Certificate

active

06246706

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
This invention relates to laser writing, and more particularly to a method and apparatus for laser writing using a diode pumped, mode-locked laser and/or laser/amplifier system.
2. Description of Related Art
The production of an integrated circuit normally begins with a photomask, which is a photographic negative of a layer of the circuit. The photomask for the first layer of the integrated circuit is projected onto a wafer of silicon which is coated with a photosensitive material. The latent image of the circuit pattern for the first layer is then developed, and the silicon uncovered in this process is appropriately treated to change its electrical characteristics. The steps are repeated for each circuit layer using an appropriate photomask.
Two masking techniques used are contact printing, in which the mask is in contact or in extremely close proximity to the photoresist layer, and projection printing, in which the mask is imaged onto the photoresist. Projection printing offers the advantage that the mask is out of contact with the photoresist, thereby avoiding the hazard of accidental abrasion of the photoresist coating or the mask. A disadvantage is that, generally speaking, increases in the resolution of the image lens are accompanied by reductions of the image field; that is, reductions in the mask area that can be imaged onto the wafer.
In the fabrication of semiconductor devices by photolithographic techniques, a semiconductor wafer is coated with a photoresist, and exposed to actinic light projected through a mask. Development and etching of the selectively exposed photoresist defines a pattern on the wafer surface which may be used for establishing diffusion areas, conductor patterns, and the like. Modern integrated circuit fabrication requires several printing steps to be performed successively, with each mask exposure being in precisely controlled registration with previously formed patterns.
Contact printing was later supplanted by one-to-one projection printing of the circuit onto the photoresist material. Reticles have also been used. These reticles are photomasks of one layer of an integrated circuit pattern enlarged ten times and produced on a glass plate.
Photomasks are produced by photographic reduction of computer generated artwork with the use of a raster-scanned beam.
SUMMARY OF THE INVENTION
Accordingly, an object of the invention is to provide a method and apparatus for laser writing.
Another object of the invention is to provide a method and apparatus for laser writing using a diode pumped laser or laser/amplifier system.
Yet another object of the invention is to provide a method and apparatus for laser writing using a diode pumped, mode locked, laser or laser/amplifier system.
These and other objects of the invention are achieved in a laser writing system including a high reflector and an output coupler that difine an oscillator cavity. A gain medium and a mode locking device are positioned in the oscillator cavity. A diode pump source produces a pump beam that is incident on the gain medium and an output beam is produced. A support holds a workpiece. Means are provided for directing the output beam across the workpiece.
In another embodiment, the laser writing system includes a high reflector and an output coupler that define an oscillator cavity. A gain medium and a mode locking device are positioned in the oscillator cavity. A first amplifier is coupled to the oscillator cavity. A diode pump source produces a pump beam that is incident on the gain medium and an output beam is produced and amplified by the first amplifier. A support holds a workpiece. Means are provided for directing the amplified output beam across the workpiece.
In another embodiment, a method of laser writing provides a diode pumped laser system including an oscillator cavity, a gain medium and a mode locking device positioned in the oscillator cavity. An output beam is produced from the laser system. The output beam is directed to a workpiece surface.


REFERENCES:
patent: 4436806 (1984-03-01), Rendulic et al.
patent: 4724465 (1988-02-01), Davies
patent: 4727381 (1988-02-01), Bille et al.
patent: 5109149 (1992-04-01), Leung
patent: 5127987 (1992-07-01), Okudaira et al.
patent: 5206868 (1993-04-01), Deacon
patent: 5287373 (1994-02-01), Rapopor et al.
patent: 5570384 (1996-10-01), Nishida et al.
patent: 5627854 (1997-05-01), Knox
patent: 5745284 (1998-04-01), Goldberg et al.
patent: 5812308 (1998-09-01), Kafka et al.
patent: 5834160 (1998-11-01), Ferry et al.
patent: 5840239 (1998-11-01), Partanen et al.
patent: 195 29 656 A1 (1997-02-01), None
patent: 0 818 858 A2 (1998-01-01), None
patent: WO 97/45902 (1997-04-01), None
patent: WO 98/27450 (1998-06-01), None
patent: WO 98/33096 (1998-07-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Laser writing method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Laser writing method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Laser writing method and apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2496721

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.