Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate
2001-11-02
2003-09-23
Fuller, Rodney (Department: 2851)
Photocopying
Projection printing and copying cameras
Step and repeat
C355S067000, C355S068000, C355S071000, C358S001140, C347S250000
Reexamination Certificate
active
06624878
ABSTRACT:
This application is the national phase under 35 U.S.C. § 371 of PCT International Application No. PCT/SE00/00136 which has an International filing date of Jan. 21, 2000, which designated the United States of America and was published in English.
FIELD OF THE INVENTION
The present invention relates to a system and a method for microlithographic writing on photosensitive substrates, and specially printing of patterns with extremely high precision, such as photomasks for semiconductor device patterns, display panels, integrated optical devices and electronic interconnect structures. The terms writing and printing should be understood in a broad sense, meaning exposure of photoresist and photographic emulsion, but also the action of light on other light sensitive media such as dry-process paper, by ablation or chemical processes activated by light or heat. Light is not limited to mean visible light, but a wide range of wavelengths from infrared to extreme UV.
BACKGROUND OF THE INVENTION
A system and method for microlithographic writing of a substrate is previously known from e.g. EP 0 467 076 by the same applicant. In general a system for microlithographic writing, as is shown in
FIG. 1
, comprises a light source
1
, such as a laser, a first lens
2
to contract the light beams, a modulator
3
to produce the desired pattern to be written, the modulator being controlled according to input data, a reflecting mirror
4
to direct the beams towards the substrate
6
, and a lens
5
to contract the beams before the reach the substrate. The mirror
4
can be used for a scanning operation to scan the beam over scan lines at the substrate. Several functionally equivalent scanners such as acusto-optic deflectors etc. could also be used. Further, the substrate is preferably arranged on a object table. Two-dimensional relative motion between the lens
5
and the table (stage) is provided and controlled by servo systems. For example the object table could be movable in at least two orthogonal directions, by means of two electrical servomotors. This motion is an inertial mechanical motion, and it is relatively difficult to change the velocity motion quickly. Further, this is irrespective of if it is the object table or the lens that is moving, since both possess a substantial mass.
However, a problem with such known writing systems are that the emitted output power from the laser is not constant, but suffers from significant variations due to so called drop-outs. Such drop-outs are significant drops in the light output, typically at least a 25% power drop, with a typical duration of about 500 &mgr;s, and they occurs once every 10 h -1000 h, depending on the type of laser, the age of the laser etc. The problem is especially important for continuous gas lasers.
A short drop-out for about 500 &mgr;s can typically result in a loss of about 20 scan-lines in the pattern, and such an unwanted hole in the pattern normally ruins the whole mask. For very large patterns, such as large-area photomasks, which normally take about 10 hours to write, the problem is more likely to occur, at the same time as the value of an error free mask is very high.
Several other problems of the same kind could arise, such as electronic errors, vibration errors and the like. These problems also generate temporary interruptions in the continuous writing process.
Other types of pattern generators encounter similar problems, and the invention is not limited to pattern generators using microlithography.
SUMMARY OF THE INVENTION
It is therefore an object of the present invention to provide a system in which the above mentioned temporary abnormal interruption problems in the prior art are solved.
This object is achieved with a system according to the appended claims.
By abnormal writing error conditions are in this application meant error conditions that can be detected and are abnormal in the sense that they could not in practice be foreseen. Hence, problems that occur at regular time intervals are not considered abnormal, and neither is for example “data starve”, i.e. when the supply of data is too slow relative to the writing speed, in a system where this condition can be foreseen from data volume and writing mechanics and handled in an ordinary fashion.
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patent: 3632205 (1972-01-01), Marcy
patent: 4218142 (1980-08-01), Kryger et al.
patent: 4313188 (1982-01-01), Bartolini et al.
patent: 4464030 (1984-08-01), Gale et al.
patent: 4477821 (1984-10-01), Yamamoto et al.
patent: 4598197 (1986-07-01), Morita et al.
patent: 5315111 (1994-05-01), Burns et al.
patent: 5477304 (1995-12-01), Nishi
patent: 5495279 (1996-02-01), Sandstrom
patent: 5631692 (1997-05-01), Maruyama
patent: A2 0467076 (1992-01-01), None
patent: A9186074 (1997-07-01), None
Gullstrand Stefan
Odselius Leif
Sandstrom Torbjorn
Thuren Anders
Birch & Stewart Kolasch & Birch, LLP
Fuller Rodney
Micronic Laser Systems AB
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