Laser vapor deposition apparatus

Details Laser vapor deposition apparatus Laser vapor deposition apparatus

1990-05-07

1992-02-04

Beck, Shrive

Coating apparatus

With vacuum or fluid pressure chamber

With means to apply electrical and/or radiant energy to work...

118620, 118723, 118726, 118727, 118719, 21912184, 21912186, 427 531, C23C 1424, C23C 1428

Patent

active

050851667

ABSTRACT:
A laser vapor deposition apparatus includes a vacuum chamber which includes an exhaust port and in which a material to be vaporized and a substrate are enclosed, a laser beam source for irradiating the material to be vaporized with a laser beam so as to deposit from the material a desired compound onto the substrate, and a gas supply source which supplies to the surface of the material, a gas that can prevent changes in property of the material which could be caused by the laser beam irradiation.

REFERENCES:
patent: 4758388 (1988-07-01), Hamada et al.
patent: 4816293 (1989-03-01), Hiramoto et al.
patent: 4861750 (1989-08-01), Nogawa et al.
patent: 4874741 (1989-10-01), Shaw et al.
patent: 4920094 (1990-04-01), Nogawa et al.

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