Laser stimulated high current density photoelectron generator an

Details Laser stimulated high current density photoelectron generator an Laser stimulated high current density photoelectron generator an

1983-08-22

1984-07-17

Smith, Alfred E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

313542, G21K 504, H01J 4006, H01J 4016

Patent

active

044608314

ABSTRACT:
An electron beam generator particularly adapted for direct-write semiconductor lithography applications is disclosed which includes a photoemissive cathode, a modulable laser for illuminating the photoemissive cathode, and light optics to create an optical pattern on the cathode. The photoemissive cathode is composed of a light transmissive substrate onto which is deposited an optically semitransparent, electrically conductive film. This film in turn is coated with a thin layer of a photoemissive substance such as cesium antimonide so that the photoemissive cathode emits an intense and substantially monochromatic beam of electrons upon laser light illumination. The emitted electron beam is configured in accordance with the optical pattern created on the cathode, and in passing through successive electron optical devices is further shaped and sized for use, for example, in lithographically generating very large scale integrated (VLSI) circuits on semiconductors.

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