Laser sputtering apparatus

Details Laser sputtering apparatus Laser sputtering apparatus

1990-07-27

1991-11-19

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118720, 118722, 118724, 118726, 118727, 427 531, C23C 1648

Patent

active

050656970

ABSTRACT:
A laser sputtering apparatus includes a vacuum chamber, a laser for radiating a laser beam, a vacuum sealing window arranged at the chamber for introducing the beam into the chamber, a film transporting device for transporting a film while the film is passing near the window and a substrate holder arranged opposite to the window with the film therebetween for holding a substrate. The film has high laser transmission and a surface over which material for a thin film to be formed on the substrate is deposited. The device transports the film while the surface of the film is opposed to the substrate. The laser beam sputters the material on the thin film onto the substrate.

REFERENCES:
patent: 4588674 (1986-05-01), Stewart
patent: 4604294 (1986-08-01), Tanaka
Gutfeld, IBM Tech. Dis. Bul., vol. 17, No. 6, Nov. 1974, p. 1807.

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