Laser sputtering apparatus

Details Laser sputtering apparatus Laser sputtering apparatus

1989-07-06

1991-05-21

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

2041921, 20419222, 20429811, 427 531, C23C 1434

Patent

active

050172778

ABSTRACT:
A laser sputtering apparatus has a vacuum chamber, a target holder installed in the vacuum chamber, arranged to oppose the target in the vacuum chamber, a substrate mounted on the substrate support, and a laser beam source which emits laser beams onto the target through a window provided in the vacuum chamber wall, providing a laser sputtering apparatus that supplies dielectric thin films with a high permittivity and a high withstanding voltage.

REFERENCES:
patent: 4664769 (1987-05-01), Cuomo et al.
D. Lubben et al., J. Vac. Sci. Technol. vol. B3 No. 4, Jul./Aug. 1985, pp. 968-974.

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