Laser scanning apparatus and methods for thermal processing

Details Laser scanning apparatus and methods for thermal processing Laser scanning apparatus and methods for thermal processing

2007-01-02

2007-01-02

Johnson, Jonathan (Department: 1725)

Electric heating

Metal heating

By arc

Reexamination Certificate

active

10806014

ABSTRACT:
Apparatus and methods for thermally processing a substrate with scanned laser radiation are disclosed. The apparatus includes a continuous radiation source and an optical system that forms an image on a substrate. The image is scanned relative to the substrate surface so that each point in the process region receives a pulse of radiation sufficient to thermally process the region.

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Naem, Boothroyd, Calder,CW Laser Annealed Small-Geometry NMOS Transistors, Mat. Res. Soc. Symp. Proc. vol. 23 (1984) pp. 229-234.
Goetzlich, Tsien, Ryssel,Relaxation Behavior of Metastable AS and P Concentrations in SI After Pulsed and CW Laser Annealing, Mat. Res. Soc. Symp. Proc. vol. 23 (1984) pp. 235-240.

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