Electric heating – Metal heating – By arc
Reexamination Certificate
2006-12-26
2006-12-26
Johnson, Jonathan (Department: 1725)
Electric heating
Metal heating
By arc
C219S121650
Reexamination Certificate
active
07154066
ABSTRACT:
Apparatus and methods for thermally processing a substrate with scanned laser radiation are disclosed. The apparatus includes a continuous radiation source and an optical system that forms an image on a substrate. The image is scanned relative to the substrate surface so that each point in the process region receives a pulse of radiation sufficient to thermally process the region.
REFERENCES:
patent: 3757078 (1973-09-01), Conti et al.
patent: 4288678 (1981-09-01), La Rocca
patent: 4356375 (1982-10-01), Josephy et al.
patent: 4480168 (1984-10-01), Cielo et al.
patent: 4734912 (1988-03-01), Scerbak et al.
patent: 4761786 (1988-08-01), Baer
patent: 4908493 (1990-03-01), Susemihl
patent: 5057664 (1991-10-01), Johnson et al.
patent: 5298719 (1994-03-01), Shafir
patent: 6208673 (2001-03-01), Miyake
patent: 6236446 (2001-05-01), Izumi et al.
patent: 6366308 (2002-04-01), Hawryluk et al.
patent: 6531681 (2003-03-01), Markle et al.
patent: 6747245 (2004-06-01), Talwar et al.
Naem, Boothroyd, Calder,CW Laser Annealed Small-Geometry NMOS Transistors, Mat. Res. Soc. Symp. Proc. vol. 23 (1984) pp. 229-234.
Goetzlich, Tsien, Ryssel,Relaxation Behavior of Metastable AS and P Concentrations in SI After Pulsed and CW Laser Annealing, Mat. Res. Soc. Symp. Proc. vol. 23 (1984) pp. 235-240.
Markle David A.
Talwar Somit
Johnson Jonathan
Jones Allston L.
Ultratech, Inc.
LandOfFree
Laser scanning apparatus and methods for thermal processing does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Laser scanning apparatus and methods for thermal processing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Laser scanning apparatus and methods for thermal processing will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3664458