Laser rounding a sharp semiconductor projection

Details Laser rounding a sharp semiconductor projection Laser rounding a sharp semiconductor projection

1979-06-18

1981-02-10

Rutledge, L. Dewayne

Metal treatment

Compositions

Heat treating

219121L, 357 91, 427 531, H01L 21263, H01L 21268

Patent

active

042499607

ABSTRACT:
A method of rounding a sharp semiconductor projection jutting out from a principal body of semiconductor material comprises the step of irradiating the projection with a laser pulse having an energy density of less than about 1.5 joules/cm.sup.2.

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patent: 4059461 (1977-11-01), Fan et al.
patent: 4113516 (1978-09-01), Ponczak et al.
Fan et al., "Crystallization . . . Laser Heating" Appl. Phys. Letts. 27, (1975) 224.
Andrew et al., "Fast Crystallization . . . Ge Films" J. Appl. Phys. 50, (Feb. 1979) 1142.
Hofker et al., "Laser Irradiation . . . Dislocations" Appl. Phys. Letts. 34, (May 1979) 690.
Wu et al., "Pulsed Laser Annealing . . . " Appl. Phys. Letts. 34, (Jun. 1, 1979) 737.
Bean et al., "Substrate . . . Laser-induced . . . Si" J. Appl. Phys. 50, (Feb. 1979) 881.
Bertolotti et al., "Structure Transitions . . . Laser . . . ", J. Appl. Phys. 50, (Jan. 1979) 259.
Baeri et al., "A Melting Model . . . Laser Annealing . . . " J. Appl. Phys. 50, (Feb. 1979) 788.
Hutchins, "Localized. .. Diffusions . . . Laser Melting . . . " IBM-TDB, 16 (1974), 2585.
"Laser Annealing . . . PN Junctions" Physics Today, (Jul. 1978), p. 17-20.
"Laser Annealing:Processing S/C Without Furnace" Science, vol. 201 (Jul. 1978), p. 333.

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