Laser-produced plasma EUV light source with isolated plasma

Radiant energy – Radiant energy generation and sources – With radiation modifying member

Reexamination Certificate

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C378S119000

Reexamination Certificate

active

06933515

ABSTRACT:
An EUV radiation source (40) that includes a nozzle (42) positioned a far enough distance away from a target region (50) so that EUV radiation (56) generated at the target region (50) by a laser beam (54) impinging a target stream (46) emitted from the nozzle (42) is not significantly absorbed by target vapor proximate the nozzle (42). Also, the EUV radiation (56) does not significantly erode the nozzle (42) and contaminate source optics (34). In one embodiment, the nozzle (42) is more than 10 cm away from the target region (50).

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patent: WO 02/32197 (2002-04-01), None
Hansson, Bjorn A.M.; Rymell, Lars; Berglund, Magnus; Hemberg, Oscar; Janin, Emmanuelle; Mosesson, Sofia and Thoresen, Jalmar; “A Liquid-Xenon-Jet Laser-Plasma Source for EUV Lithography”, 3rd International Workshop on EUV Lithography, 2001, 5 pps.
Wieland, M.; Wilhein, T.; Faubel, M.; Ellert, Ch.; Schmidt, M.; and Sublemontier, O.;“EUV and Fast Ion Emission from Cryogenic Liquid Jet Target Laser-Generated Plasma” Appl. Phys. B 72, 591-597 (2001)/Digital Object Identifier (DOI) 10.1007/s003400100542.
Rymell, L.; Berglund, M; Hansson, B.A.M.; and Hertz, H.M.; “X-Ray and EUV Laser-Plasma Sources Based on Cryogenic Liquid-Jet Target”; Biomedical and X-Ray Physics, Royal Institute of Technology, SE-10044 Stockholm, Sweden; Part of the SPIE Conference on Emerging Lithograph Technologies III, Santa Clara, California, Mar. 1999; pp. 421-423.
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