Radiant energy – Radiant energy generation and sources – With radiation modifying member
Reexamination Certificate
2010-01-11
2011-10-11
Nguyen, Kiet (Department: 2881)
Radiant energy
Radiant energy generation and sources
With radiation modifying member
Reexamination Certificate
active
08035092
ABSTRACT:
A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
REFERENCES:
patent: 4223279 (1980-09-01), Bradford, Jr. et al.
patent: 4247829 (1981-01-01), Yagi et al.
patent: 4251781 (1981-02-01), Sutter, Jr.
patent: 4414488 (1983-11-01), Hoffmann et al.
patent: 4445658 (1984-05-01), Ferron
patent: 4546482 (1985-10-01), Bagaglia et al.
patent: 4686682 (1987-08-01), Haruta et al.
patent: 4703490 (1987-10-01), Brumme et al.
patent: 4742527 (1988-05-01), Wiedemann et al.
patent: 4774714 (1988-09-01), Javan
patent: 4860300 (1989-08-01), Baumler et al.
patent: 4866682 (1989-09-01), Uchihashi et al.
patent: 4876693 (1989-10-01), Lucero et al.
patent: 4953174 (1990-08-01), Eldridge et al.
patent: 4959840 (1990-09-01), Akins et al.
patent: 5023884 (1991-06-01), Akins et al.
patent: 5025445 (1991-06-01), Anderson et al.
patent: 5025446 (1991-06-01), Kuizenga
patent: 5048041 (1991-09-01), Akins et al.
patent: 5070513 (1991-12-01), Letardi
patent: 5187716 (1993-02-01), Haruta et al.
patent: 5189678 (1993-02-01), Ball et al.
patent: 5247534 (1993-09-01), Muller-Horsche
patent: 5313481 (1994-05-01), Cook et al.
patent: 5315611 (1994-05-01), Ball et al.
patent: 5359620 (1994-10-01), Akins et al.
patent: 5448580 (1995-09-01), Birx et al.
patent: 5471965 (1995-12-01), Kapich
patent: 5535233 (1996-07-01), Mizoguchi et al.
patent: 5557629 (1996-09-01), Mizoguchi et al.
patent: 5646954 (1997-07-01), Das et al.
patent: 5729565 (1998-03-01), Meller et al.
patent: 5763930 (1998-06-01), Partlo
patent: 5771258 (1998-06-01), Morton et al.
patent: 5790574 (1998-08-01), Rieger et al.
patent: 5852621 (1998-12-01), Sandstrom
patent: 5863017 (1999-01-01), Larson et al.
patent: 5875207 (1999-02-01), Osmanow
patent: 5940421 (1999-08-01), Partlo et al.
patent: 5953360 (1999-09-01), Vitruk et al.
patent: 6005879 (1999-12-01), Sandstrom et al.
patent: 6016325 (2000-01-01), Ness et al.
patent: 6018537 (2000-01-01), Hofmann et al.
patent: 6028880 (2000-02-01), Carlesi et al.
patent: 6034978 (2000-03-01), Ujazdowski et al.
patent: 6051841 (2000-04-01), Partlo
patent: 6064072 (2000-05-01), Partlo et al.
patent: 6067311 (2000-05-01), Morton et al.
patent: 6094448 (2000-07-01), Fomenkov et al.
patent: 6104735 (2000-08-01), Webb
patent: 6109574 (2000-08-01), Pan et al.
patent: 6128323 (2000-10-01), Myers et al.
patent: 6151349 (2000-11-01), Gong et al.
patent: 6164116 (2000-12-01), Rice et al.
patent: 6192064 (2001-02-01), Algots et al.
patent: 6208674 (2001-03-01), Webb et al.
patent: 6208675 (2001-03-01), Webb
patent: 6212211 (2001-04-01), Azzola et al.
patent: 6219368 (2001-04-01), Govorkov
patent: 6240117 (2001-05-01), Gong et al.
patent: 6317447 (2001-11-01), Partlo et al.
patent: 6359969 (2002-03-01), Shmaenok
patent: 6414979 (2002-07-01), Ujazdowski et al.
patent: 6452199 (2002-09-01), Partlo et al.
patent: 6466602 (2002-10-01), Fleurov et al.
patent: 6477193 (2002-11-01), Oliver et al.
patent: 6493374 (2002-12-01), Fomenkov et al.
patent: 6541786 (2003-04-01), Partlo et al.
patent: 6549551 (2003-04-01), Partlo et al.
patent: 6556612 (2003-04-01), Ershov et al.
patent: 6567450 (2003-05-01), Myers et al.
patent: 6576912 (2003-06-01), Visser et al.
patent: 6614505 (2003-09-01), Koster et al.
patent: 6618421 (2003-09-01), Das et al.
patent: 6625191 (2003-09-01), Knowles et al.
patent: 6635844 (2003-10-01), Yu
patent: 6693939 (2004-02-01), Klene et al.
patent: 6782031 (2004-08-01), Hofmann et al.
patent: 6815700 (2004-11-01), Melnychuk et al.
patent: 6928093 (2005-08-01), Webb et al.
patent: 6972421 (2005-12-01), Melnychuk et al.
patent: 6987279 (2006-01-01), Hoshino et al.
patent: 7002168 (2006-02-01), Jacob et al.
patent: 7026629 (2006-04-01), Bakker et al.
patent: 7068697 (2006-06-01), Amada et al.
patent: 7087914 (2006-08-01), Akins et al.
patent: 7135693 (2006-11-01), Roux
patent: 7136141 (2006-11-01), Bakker
patent: 7164144 (2007-01-01), Partlo et al.
patent: 7196342 (2007-03-01), Ershov et al.
patent: 7217940 (2007-05-01), Partlo et al.
patent: 7217941 (2007-05-01), Rettig et al.
patent: 7230258 (2007-06-01), Ruzic et al.
patent: 7251012 (2007-07-01), Banine et al.
patent: 7271401 (2007-09-01), Imai et al.
patent: 7315346 (2008-01-01), Van Beek et al.
patent: 7317196 (2008-01-01), Partlo et al.
patent: 7361918 (2008-04-01), Akins et al.
patent: 7365349 (2008-04-01), Partlo et al.
patent: 7368741 (2008-05-01), Melnychuk et al.
patent: 7372056 (2008-05-01), Bykanov et al.
patent: 7378673 (2008-05-01), Bykanov et al.
patent: 7394083 (2008-07-01), Bowering et al.
patent: 7405416 (2008-07-01), Algots et al.
patent: 7415056 (2008-08-01), Das et al.
patent: 7680158 (2010-03-01), Endo et al.
patent: 2004/0081615 (2004-04-01), Brinkley, III
patent: 2005/0259709 (2005-11-01), Das et al.
patent: 2006/0012761 (2006-01-01), Bakker et al.
patent: 2006/0091109 (2006-05-01), Partlo et al.
patent: 2006/0175558 (2006-08-01), Bakker et al.
patent: 2006/0219957 (2006-10-01), Ershov et al.
patent: 2006/0243927 (2006-11-01), Tran et al.
patent: 2006/0249699 (2006-11-01), Bowering et al.
patent: 2006/0250500 (2006-11-01), Bakker et al.
patent: 2006/0255298 (2006-11-01), Bykanov et al.
patent: 2006/0268246 (2006-11-01), Jacobs et al.
patent: 2007/0001131 (2007-01-01), Ershov et al.
patent: 2007/0102653 (2007-05-01), Bowering et al.
patent: 2007/0145297 (2007-06-01), Freriks et al.
patent: 2007/0158594 (2007-07-01), Shirai et al.
patent: 2007/0228298 (2007-10-01), Komori et al.
patent: 2007/0291279 (2007-12-01), Rafac
patent: 2007/0291350 (2007-12-01), Ershov et al.
patent: 2008/0043321 (2008-02-01), Bowering et al.
patent: 2008/0048133 (2008-02-01), Bykanov et al.
patent: 2008/0087847 (2008-04-01), Bykanov et al.
patent: 2008/0149862 (2008-06-01), Hansson et al.
patent: 1434095 (2004-06-01), None
patent: 1674932 (2008-01-01), None
patent: 2006-329664 (2006-12-01), None
patent: 2007-220949 (2007-08-01), None
patent: 2007-317598 (2007-12-01), None
patent: WO 2004/092693 (2004-10-01), None
patent: WO 2005/015962 (2005-02-01), None
Harilal, et al., “Ion debris mitigation from tin plasma using ambient gas, magnetic field and combined effects,” J. Appl. Phys. B—Lasers and Optics, pp. 1-7;Center for Energy Research, Univ. of Calif., San Diego(2006).
Harilal, et al., “Spectroscopic characterization of laser-induced tin plasma,” J. of Appl. Phys. 98 (1), 013306, pp. 1-7,Univ. of Calif. Postprints, paper 857 (2005).
Harilal, et al., “Debris mitigation in a laser-produced tin plume using a magnetic field,” J. of App. Phys., 98, 036102, pp. 1-3,American Institute of Physics(2005).
Harilal, et al., “Ambient gas effects on the dynamics of laser-produced tin plume expansion,” J. of App. Physics, 99, 083303, pp. 1-10,American Institute of Physics(2006).
Hershcovitch, “High-pressure arcs as vacuum-atmosphere interface and plasma lens for nonvacuum electron beam welding machines, electron beam melting, and nonvacuum ion material modification,” J. Appl. Phys. 78 (9). pp. 5283-5288.American Institute of Physics(1995).
Tao, et al., “Mitigation of fast ions from laser-produced Sn plasma for an extreme ultraviolet lithography source,” in App. Physics Letters 89, 111502,American Institute of Physics(2006).
Tao, et al., “Characterizing and optimizing the density profile of double-pulse laser-produced Sn-based plasmas to enhance conversion efficiency and mitigate debris for an EUVL source,” Center for Energy Research, Univ. of Calif. UCSD-CER-05-07 (2005).
Tao, et al., “A mass-limited Sn target
Bowering Norbert
Bykanov Alexander N.
Ershov Alexander I.
Fomenkov Igor V.
Khodykin Oleh
Cymer Inc.
Nguyen Kiet
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