Semiconductor device manufacturing: process – Semiconductor substrate dicing – By electromagnetic irradiation
Reexamination Certificate
2010-01-15
2011-10-25
Garber, Charles (Department: 2812)
Semiconductor device manufacturing: process
Semiconductor substrate dicing
By electromagnetic irradiation
C257SE21237
Reexamination Certificate
active
08043941
ABSTRACT:
An object to be processed can be cut highly accurately along a line to cut.An object to be processed1is irradiated with laser light while locating a converging point within a silicon wafer11, and the converging point is relatively moved along a line to cut5, so as to form modified regions M1, M2positioned within the object1along the line to cut5, and then a modified region M3positioned between the modified regions M1, M2within the object1.
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Sakamoto Takeshi
Sugiura Ryuji
Drinker Biddle & Reath LLP
Garber Charles
Hamamatsu Photonics K.K.
Patel Reema
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