Laser process

Details Laser process Laser process

1996-09-06

1999-01-12

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427527, 438522, 438530, 438535, B05D 300, C23C 1414

Patent

active

058584730

ABSTRACT:
A laser annealing process for recovering crystallinity of a deposited semiconductor film such as of silicon which had undergone morphological damage, said process comprising activating the semiconductor by irradiating a pulsed laser beam operating at a wavelength of 400 nm or less and at a pulse width of 50 nsec or less onto the surface of the film, wherein,

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