Laser plasma generation method and system

Details Laser plasma generation method and system Laser plasma generation method and system

2005-08-16

2005-08-16

Harvey, Minsun Oh (Department: 2828)

Coherent light generators

Particular pumping means

Pumping with optical or radiant energy

C372S056000, C372S078000

Reexamination Certificate

active

06931049

ABSTRACT:
A main laser beam is focused to irradiate a tip of a high-density spouting gas flow formed by heating and then vaporizing a target material by a light beam for preheating making it to the plasma. As the result, the generation of a fast debris in the target material can be suppressed. And a discharge of the fast debris from the target material is also suppressed and extinguished by heating and then vaporizing them by a light beam for transpiration which is emitted at an adjusted time after the generation of the plasma. Thus, the fast debris which still appears in the plasma formed after preheating can be almost perfectly vaporized and extinguished by the light beam for transpiration.

REFERENCES:
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patent: 6388227 (2002-05-01), Dykhno et al.
patent: 6417485 (2002-07-01), Troitski
patent: 11-250842 (1999-09-01), None
Hoffman et al., “High Brightness Laser/Plasma Source for High Throughput Submicron X-ray Lithography”,Vacuum Science and TechnologyB3(1), Jan./Feb. 1985, pp. 258-261.
Kandaka et al., “Effective Reduction of Debris Emitted from a Laser-Produced Plasma”,Japan J. Appl. Phys.,vol. 37, Feb. 1998, pp. L174-L176.

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