Laser plasma EUV light source, target material, tape...

Details Laser plasma EUV light source, target material, tape... Laser plasma EUV light source, target material, tape...

2006-01-11

2008-11-25

Souw, Bernard E (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

C250S493100, C250S461100, C378S119000, C378S124000, C378S126000, C378S143000, C378S144000

Reexamination Certificate

active

07456417

ABSTRACT:
Target1that is arranged in the disc direction is sprayed from nozzle2that has a slit-shaped aperture. Target1is conveyed on a gas stream. He gas is used in this example. Nozzle2may be vibrated by a piezo apparatus to spray disc-shaped target1. Target1that is sprayed from nozzle2reaches the irradiation position of laser light with its direction unchanged since the exterior of nozzle2is maintained in a high vacuum. Synchronized with delivery of target1, pulse laser light5from Nd:YAG light source4is focused by lens3and irradiated onto target1. The spot diameter of the laser is the same 1 mm diameter as that of target1. The thickness is not more than 1000 nm. Therefore, virtually the entire target is converted into plasma, debris generation is inhibited and the conversion efficiency is elevated.

REFERENCES:
patent: 4835120 (1989-05-01), Mallik et al.
patent: 4980219 (1990-12-01), Hiraide et al.
patent: 5019209 (1991-05-01), Hiraide et al.
patent: 5577092 (1996-11-01), Kublak et al.
patent: 6324255 (2001-11-01), Kondo et al.
patent: 6452661 (2002-09-01), Komatsuda
patent: 6724004 (2004-04-01), Yashiro
patent: 6727980 (2004-04-01), Ota et al.
patent: 6744851 (2004-06-01), Orsini et al.
patent: 6831963 (2004-12-01), Richardson
patent: 6865255 (2005-03-01), Richardson
patent: 6927405 (2005-08-01), Bonnet et al.
patent: 6977383 (2005-12-01), Rieger et al.
patent: 6984941 (2006-01-01), Hiramoto et al.
patent: 6995382 (2006-02-01), Ziener et al.
patent: 7122816 (2006-10-01), Algots et al.
patent: 7164144 (2007-01-01), Partlo et al.
patent: 7196342 (2007-03-01), Ershov et al.
patent: 7361918 (2008-04-01), Akins et al.
patent: 7388220 (2008-06-01), Fomenkov et al.
patent: 2002/0094063 (2002-07-01), Nishimura et al.
patent: 2003/0223543 (2003-12-01), Orsini et al.
patent: 2004/0200977 (2004-10-01), Rieger et al.
patent: 2004/0264512 (2004-12-01), Hartlove et al.
patent: 2005/0199829 (2005-09-01), Partlo et al.
patent: 2005/0245382 (2005-11-01), Iwahashi et al.
patent: 2006/0097203 (2006-05-01), Bykanov et al.
patent: 2006/0219957 (2006-10-01), Ershov et al.
patent: 2007/0001130 (2007-01-01), Bykanov et al.
patent: 2007/0007469 (2007-01-01), Murakami et al.
patent: 2007/0170377 (2007-07-01), Nakano
patent: 0 858 249 (1998-08-01), None
patent: 1 367 445 (2003-12-01), None
patent: 62-117246 (1987-05-01), None
patent: 02-100297 (1990-04-01), None
patent: 07-167998 (1995-07-01), None
patent: H07-167998 (1995-07-01), None
patent: 11-312638 (1999-11-01), None
patent: 2000-56099 (2000-02-01), None
patent: 2001-023795 (2001-01-01), None
patent: 2005-276673 (2005-10-01), None
patent: 2006-085940 (2006-03-01), None
patent: WO 2004/062050 (2004-07-01), None
Emerging Lithographic Technologies II, Yuli Vladimirsky, vol. 3331, Proceedings of SPIE, Feb. 23-25, 1998.
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, John M. Warlaumont, vol. 2437, Proceedings of SPIE, Feb. 20-21, 1995.
Extended Abstracts (The 65thAutumn Meeting, 2004); The Japan Society of Applied Physics, No. 2, Apr. 1, 2004.
European Search Report dated Mar. 17, 2008 for International Application No. PCT/JP2005024221, 18 pages.
Komori, H. et al., “Laser-produced-plasma light source development for extreme ultraviolet lithography,” Journal of Vacuum Science & Technology, vol. B. 21, No. 6, pp. 2843-2847, Nov. 2003.

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