Laser pattern generation apparatus

Details Laser pattern generation apparatus Laser pattern generation apparatus

1992-11-02

1995-01-31

Reinhart, Mark J.

Recorders

Printing, dotting, or punching marker

Ink transfer support or moving means

B41J 2435

Patent

active

053862210

ABSTRACT:
An improved laser pattern generation apparatus. The improved pattern generation apparatus of the present invention uses a laser beam to expose a radiant sensitive film on the workpiece to print circuit patterns on a substrate. The laser beam is aligned using a beam steering means. The laser beam is split into 32 beams to create a brush. The brush scans the workpiece through use of a rotating polygonal mirror. Each beam of the brush may have one of seventeen intensity values. The beams are modulated by an Acousto-Optical Modulator. Signals provided to the Acousto-Optical Modulator define the pattern to be generated. These signals are created by a rasterizer. Increased print speed is accomplished through the use of a wider brush and a print strategy that eliminates physical stage passes.

REFERENCES:
patent: Re33931 (1992-05-01), Witney
patent: 4639073 (1987-01-01), Yip et al.
patent: 4778233 (1988-10-01), Christenson et al.
patent: 4796038 (1989-01-01), Allen et al.
patent: 4797696 (1989-01-01), Allen et al.
patent: 4956650 (1990-09-01), Allen et al.
Michael L. Rieger, James A. Schoeffel, Paul A. Warkentin, 1988 SPIE Santa Clara Symposium Conference 922-Optical Microlithography VII, Image Quality Enhancements for Raster Scan Lithography, 10 pages.

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