Laser mask and crystallization method using the same

Details Laser mask and crystallization method using the same Laser mask and crystallization method using the same

2004-12-21

2009-08-04

Booth, Richard A. (Department: 2812)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C438S166000, C250S492220, C257SE21561

Reexamination Certificate

active

07569307

ABSTRACT:
A laser mask includes a mask pattern with edges having inverted shapes to alleviate the effects of diffraction of laser beams to reduce overlap regions such that crystallization characteristics are improved. The laser mask includes a mask pattern that includes transmitting regions and a blocking region. The edges of the mask have shapes inverted to the shapes of the edges of a silicon thin film crystallized by the pattern.

REFERENCES:
patent: 6736895 (2004-05-01), Jung
patent: 2004/0127066 (2004-07-01), Jung
patent: 2005/0124145 (2005-06-01), Jung
patent: 2005/0142450 (2005-06-01), Jung

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