Laser mask and crystallization method using the same

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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Reexamination Certificate

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07316871

ABSTRACT:
A crystallization method using a mask includes providing a substrate having a semiconductor layer; positioning a mask over the substrate, the mask having first, second and third blocks, each block having a periodic pattern including a plurality of transmitting regions and a blocking region, the periodic pattern of the first block having a first position, the periodic pattern of the second block having a second position, the periodic pattern of the third block having a third position, the first, second and third positions being different from each other; and crystallizing the semiconductor layer by irradiating a laser beam through the mask.

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patent: 103 29 332 (2004-07-01), None
patent: 2396962 (2004-07-01), None
patent: WO 01/18854 (2001-03-01), None
patent: WO 2004/017382 (2004-02-01), None

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