Laser marking enhancement system using reflection from the mask

Details Laser marking enhancement system using reflection from the mask Laser marking enhancement system using reflection from the mask

1985-04-05

1987-01-27

Goldberg, E. A.

Recorders

Thermal recording

346107R, 346 11, 350403, 355 78, G01D 900, G01D 942, G02B 530, G03B 2702

Patent

active

046397400

ABSTRACT:
A method and apparatus for laser marking of an article in which a pulsed, linearly polarized laser beam is passed through a stencil-type mask and imaged onto an article to be marked.
In order to increase the overall transmission and hence the efficiency of the process, at least part of the laser beam energy which is reflected from the opaque parts of the mask is collected and redirected to the mask. The apparatus includes means for separating by beam polarization that portion of the laser radiation reflected by the opaque parts of the stencil and means for reflecting said portion of the radiation back to the stencil.

REFERENCES:
patent: 3588439 (1971-06-01), Heller
patent: 3657510 (1972-04-01), Rothrock
patent: 4523849 (1985-06-01), Stone

Affiliated with

Also associated with

Rating

Laser marking enhancement system using reflection from the mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Laser marking enhancement system using reflection from the mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Laser marking enhancement system using reflection from the mask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-860790