Semiconductor device manufacturing: process – Semiconductor substrate dicing – By electromagnetic irradiation
Reexamination Certificate
2011-05-24
2011-05-24
Vu, David (Department: 2818)
Semiconductor device manufacturing: process
Semiconductor substrate dicing
By electromagnetic irradiation
C257SE21238, C216S094000, C219S121690
Reexamination Certificate
active
07947575
ABSTRACT:
A method of laser machining a feature in a substrate includes machining the substrate with a pulsed laser along a scan line so that the successive pulses81at the substrate do not overlap but are either contiguous or spaced apart. Pulses82, 83, 84in respective succeeding scans of the laser along the scan line, are offset with respect to the starting point of pulses81, 82, 83in a previous scan so that multiple successive laser scans provide machining to a required depth while successively smoothing edges,91, 92, 93, 94of the feature with each pass.
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Dunne Kali
O'Briain Fallon Callian Cillian
Electro Scientific Industries Inc.
Taylor Earl N
Vu David
Young & Basile
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