Laser irradiation method

Details Laser irradiation method Laser irradiation method

1996-10-09

1999-07-20

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

118 70, 118600, 427294, 427399, 427554, 427555, 427572, 427574, 427578, 437173, 437225, C23C 1402

Patent

active

059254211

ABSTRACT:
In processing an object by irradiating it with laser light, a laser irradiation chamber is evacuated to a pressure value suitable for the intended laser light processing and the laser light processing is performed with the pressure in the chamber kept constant at the above value. Further, electrodes are provided in the laser irradiation chamber, and the inside of the chamber is cleaned by introducing an etching gas into the chamber during or immediately before the laser light irradiation and rendering the etching gas active.

REFERENCES:
patent: 4465529 (1984-08-01), Arima et al.
patent: 5372836 (1994-12-01), Imahashi et al.
patent: 5492735 (1996-02-01), Saito

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