Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1996-10-09
1999-07-20
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
118 70, 118600, 427294, 427399, 427554, 427555, 427572, 427574, 427578, 437173, 437225, C23C 1402
Patent
active
059254211
ABSTRACT:
In processing an object by irradiating it with laser light, a laser irradiation chamber is evacuated to a pressure value suitable for the intended laser light processing and the laser light processing is performed with the pressure in the chamber kept constant at the above value. Further, electrodes are provided in the laser irradiation chamber, and the inside of the chamber is cleaned by introducing an etching gas into the chamber during or immediately before the laser light irradiation and rendering the etching gas active.
REFERENCES:
patent: 4465529 (1984-08-01), Arima et al.
patent: 5372836 (1994-12-01), Imahashi et al.
patent: 5492735 (1996-02-01), Saito
Kusumoto Naoto
Yamazaki Shunpei
Pianalto Bernard
Semiconductor Energy Laboratory Co,. Ltd.
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