Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Patent
1999-05-03
2000-11-21
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
118 70, 118600, 427173, 427225, 427294, 427399, 427444, 427554, 427555, 427572, 427574, 427578, 438759, 438795, C23C 1404, H01L 2131, H01L 2142
Patent
active
061499846
ABSTRACT:
In processing an object by irradiating it with laser light, a laser irradiation chamber is evacuated to a pressure value suitable for the intended laser light processing and the laser light processing is performed with the pressure in the chamber kept constant at the above value. Further, electrodes are provided in the laser irradiation chamber, and the inside of the chamber is cleaned by introducing an etching gas into the chamber during or immediately before the laser light irradiation and rendering the etching gas active.
REFERENCES:
patent: 5925421 (1999-07-01), Yamazaki et al.
Mori, K. "Evaluation of Electric Transport Properties of Undoped Poly-Si Films", Ricoh Technical Report, No. 21, Jul. 1992, pp. 11-18 (English Abstract included).
Kusumoto Naoto
Yamazaki Shunpei
Pianalto Bernard
Semiconductor Energy Laboratory, Inc.
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