Metal working – Barrier layer or semiconductor device making – Barrier layer device making
Reexamination Certificate
2008-01-15
2008-01-15
Graybill, David E. (Department: 2822)
Metal working
Barrier layer or semiconductor device making
Barrier layer device making
C029S610100, C219S121600, C219S121850
Reexamination Certificate
active
07318844
ABSTRACT:
The manufacturing method for an electroceramic component (1), for example a varistor (1), comprises a laser irradiation of a part (5; 6) of the surface of an electroceramic body (2) before a metallization (3; 4) is applied to the part (5; 6) of the surface. By means of the laser irradiation it is possible to produce a micro-roughness and/or a chemical modification of the surface which permits good adhesion of the metallization, and it is possible to reduce or eliminate areas of unevenness or waviness of that part (5; 6) of the surface of the electroceramic body (2) which is to be metallized. In addition, improved transverse conductivity can be produced, by virtue of which a low contact resistance and a very homogeneous current distribution is achieved, in particular near to the metallization (3; 4). In addition it is possible to remove residues which originate in particular from a sinter support or from the application of a passivation layer. After the laser irradiation, the electroceramic body advantageously has a border (9) which adjoins the part (5; 6) of the surface and which is not laser-irradiated. The laser beam can advantageously be pulsed and focused.
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Greuter Felix
Hagemeister Michael
Kessler Reto
ABB Research Ltd
Buchanan & Ingersoll & Rooney PC
Graybill David E.
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