Laser interferometric lithographic system providing automatic ch

Details Laser interferometric lithographic system providing automatic ch Laser interferometric lithographic system providing automatic ch

1996-09-27

1998-06-23

Font, Frank G.

Optics: measuring and testing

By polarized light examination

With birefringent element

356354, G01B 902

Patent

active

057710988

ABSTRACT:
An interferometric lithographic apparatus includes an arrangement for applying interfering laser beams to a part for producing a first interference pattern. The first interference pattern has a first fringe spacing. A mobile part holder stage is repositioned to change the interference pattern and produce a second fringe spacing. A control arrangement, automatically responsive to the repositioning of the part holder, re-aligns optical paths and optimally interferes the laser beams to produce the second fringe spacing.

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