Laser interferometric lithographic system providing automatic ch

Details Laser interferometric lithographic system providing automatic ch Laser interferometric lithographic system providing automatic ch

1998-05-18

2000-12-26

Kim, Robert

Optics: measuring and testing

By light interference

For dimensional measurement

356510, G01B 902

Patent

active

061668206

ABSTRACT:
An interferometric lithographic apparatus includes an arrangement for applying interfering laser beams to a part for producing a first interference pattern. The first interference pattern has a first fringe spacing. A mobile part holder stage is repositioned to change the interference pattern and produce a second fringe spacing. A control arrangement, automatically responsive to the repositioning of the part holder, re-aligns optical paths and optimally interferes the laser beams to produce the second fringe spacing.

REFERENCES:
patent: 3507564 (1970-04-01), Franks
patent: 3738753 (1973-06-01), Huntley, Jr.
patent: 5055695 (1991-10-01), Lange

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