Laser interferometer displacement measuring system, exposure...

Details Laser interferometer displacement measuring system, exposure... Laser interferometer displacement measuring system, exposure...

2005-01-04

2005-01-04

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

06839142

ABSTRACT:
An absolute accuracy in the range from ±2 nm to ±1 nm for a displacement measurement value is provided by a laser interferometer displacement measuring system. A fluctuating error component that appears corresponding to the wave cycle of laser light is detected and subtracted from the measurement value while a stage is moving, thereby providing a high accuracy.

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patent: 6008902 (1999-12-01), Rinn
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patent: 7306034 (1995-11-01), None
patent: 9178567 (1997-07-01), None
patent: 20014321 (2001-01-01), None

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