Radiation imagery chemistry: process – composition – or product th – Transfer procedure between image and image layer – image... – Imagewise heating – element or image receiving layers...
Reexamination Certificate
2005-11-08
2005-11-08
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Transfer procedure between image and image layer, image...
Imagewise heating, element or image receiving layers...
C430S005000, C430S201000
Reexamination Certificate
active
06962765
ABSTRACT:
A UV-mask, a system and method for making the mask and a method of using the mask for producing an image a print medium are disclosed. The system includes a donor element having a substrate coated with a layer of IR-sensitive material and a layers of UV-absorbing material, and a receptor element. The IR-sensitive material is capable of detaching a significant portion of the itself and the UV-absorbing material from the donor element and transfer the detached materials to the receptor element when irradiated by an IR radiation. The method for making a UV-mask includes irradiating such a donor element with an IR radiation. The method of using includes overlaying a digital UV mask on a UV-sensitive medium, exposing the medium to a UV radiation through the UV mask, and developing the UV-sensitive medium.
REFERENCES:
patent: 3833441 (1974-09-01), Heiart
patent: 4626493 (1986-12-01), Butters et al.
patent: 5171650 (1992-12-01), Ellis et al.
patent: 5256506 (1993-10-01), Ellis et al.
patent: 5278023 (1994-01-01), Bills et al.
patent: 5308737 (1994-05-01), Bills et al.
patent: 5506086 (1996-04-01), Van Zoeren
patent: 5569568 (1996-10-01), DeBoer
patent: 5576142 (1996-11-01), Neumann et al.
patent: 5695907 (1997-12-01), Chang
patent: 5773170 (1998-06-01), Patel et al.
patent: 5856062 (1999-01-01), Hoshi
patent: 5919601 (1999-07-01), Nguyen et al.
patent: 5935758 (1999-08-01), Patel et al.
patent: 5990917 (1999-11-01), Wendt
patent: 6027849 (2000-02-01), Vogel
patent: 6165671 (2000-12-01), Weidner et al.
patent: 6242152 (2001-06-01), Staral et al.
patent: 6451500 (2002-09-01), Leon
patent: 6451505 (2002-09-01), Patel et al.
patent: 6458511 (2002-10-01), Wittig et al.
patent: 6461793 (2002-10-01), Chang et al.
patent: 0258836 (1987-08-01), None
patent: 1151872 (2001-11-01), None
Buchholtz Richard C.
Kidnie Kevin M.
Swihart Donald L.
Faegre & Benson LLP
Kodak Polychrome Graphics LLC
Schilling Richard L.
LandOfFree
Laser-generated ultraviolet radiation mask does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Laser-generated ultraviolet radiation mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Laser-generated ultraviolet radiation mask will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3519343