Coherent light generators – Particular active media – Gas
Patent
1993-11-19
1995-09-12
Scott, Jr., Leon
Coherent light generators
Particular active media
Gas
372 57, 372 58, H01S 322
Patent
active
054504368
ABSTRACT:
A laser system which realizes its stable operation. In the system, a spectrum width of laser light dischargingly excited in a laser chamber is detected by a spectrum width monitor. A controller controls, on the basis of the detected spectrum width, a replenishment amount of gas to be replenished from an F2 gas cylinder into the laser chamber through a sub-tank and on-off valves to cause the spectrum width to become constant.
Further, when replenishment of a halogen gas diluted with a buffer gas is carried out, a gas exhaustion step of keeping the internal total gas pressure of the laser chamber constant is omitted.
In addition, a laser oscillation pulse number is counted for a predetermined period of time and a replenishment amount of the halogen gas is carried out according to the count value.
REFERENCES:
patent: 4975919 (1990-12-01), Amada et al.
patent: 4977573 (1990-12-01), Bittenson et al.
patent: 5081635 (1992-01-01), Wakabayashi et al.
patent: 5090020 (1992-02-01), Bedwell
patent: 5099491 (1992-03-01), Chaffee
patent: 5142543 (1992-08-01), Wakabayashi et al.
patent: 5315610 (1994-05-01), Alger et al.
"The 5th Generation in Excimer Lasers" catalog, pp. 1-23, 4-88 printed.
"Excimer Lasers w/Magnetic Switch Control" catalog, pp. 1-12 No month & year.
"SPIE Microlithography '93 San Jose" pp. 1-10 No month & year.
Fujimoto Junichi
Kowaka Masahiko
Mizoguchi Hakaru
Takahashi Tomokazu
Jr. Leon Scott
Kabushiki Kaisha Komatsu Seisakusho
LandOfFree
Laser gas replenishing apparatus and method in excimer laser sys does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Laser gas replenishing apparatus and method in excimer laser sys, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Laser gas replenishing apparatus and method in excimer laser sys will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-411770