Laser gas injection system

Coherent light generators – Particular active media – Gas

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C372S055000, C372S058000

Reexamination Certificate

active

07835414

ABSTRACT:
A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the model and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern. The method and apparatus may comprise performing gas management for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas comprising: utilizing periodic and frequent partial gas refills comprising an inject comprising a mixture of halogen gas and bulk gas in generally the same ration as the premix ratio provided to the laser in a full gas refill, and in an amount less than two percent of the total gas pressure prior to the injection.

REFERENCES:
patent: 6130904 (2000-10-01), Ishihara et al.
patent: 6389052 (2002-05-01), Albrecht et al.
patent: 6392743 (2002-05-01), Zambon et al.
patent: 6490307 (2002-12-01), de Mos et al.
patent: 6490308 (2002-12-01), Albrecht et al.
patent: RE38054 (2003-04-01), Hofmann et al.
patent: 6839375 (2005-01-01), Lokai et al.
patent: 6879617 (2005-04-01), Ariga et al.
patent: 6963595 (2005-11-01), Rule et al.
patent: 7039086 (2006-05-01), Fallon et al.
patent: 7079564 (2006-07-01), Fallon et al.
patent: 7209507 (2007-04-01), Rule et al.
patent: 7266137 (2007-09-01), Albrecht et al.
patent: 7277464 (2007-10-01), Rule et al.
patent: 7372887 (2008-05-01), Matsunaga et al.
patent: 2002/0021731 (2002-02-01), Bragin et al.
patent: 2002/0031159 (2002-03-01), Serwazi et al.
patent: 2004/0141182 (2004-07-01), Schroder et al.
patent: 2005/0094698 (2005-05-01), Besaucele et al.
patent: 2006/0239322 (2006-10-01), Matsunaga et al.
Dunstan, Wayne J.; Jacques, Robert; O'Brien, Kevin O.; Ratnam, Aravind, “Increased Availability of Lithography Light Sources using Advanced Gas Management,” SPIE Proceedings, Optical Microlithography XX, vol. 6520, Mar. 26, 2007.
PCT Search Report dated Aug. 8, 2008, International Patent Application No. PCT/US08/001348 filed Jan. 2, 2008 (10 pages).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Laser gas injection system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Laser gas injection system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Laser gas injection system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4250667

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.