Laser deposition apparatus for depositing a large area oxide thi

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure

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C23C 1400

Patent

active

058206825

ABSTRACT:
A laser deposition apparatus for a large area oxide thin film which can enable thin films of a large area to be deposited by varying a target affixing method when performing a pulse laser deposition which most effectively deposits various oxide thin films of a complex chemical composition. The apparatus in accordance with the present invention comprises a tilted target affixed to a rotatable target plate by a target frame such that the target is tilted with respect to the target plate; a substrate heater on which the substrate can be mounted and which can be rotated on its own axis; and an eximer laser installed within a vacuum chamber for irradiating a laser beam to said tilted target.

REFERENCES:
patent: 5622567 (1997-04-01), Kojima

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